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| PhE104 Infrared Spectroscopic Ellipsometer |
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Angstrom Advanced sets the standard in Ellipsometry-bringing the best in ellipsometry technology at the most affordable prices. Angstrom Advanced offers full range of ellipsometers for thin film thickness measurements, optical characterization for refractive index and extinction coefficient analysis (n & k). Our ellipsometers can be used for many different applications and are used in some of the most prestigious laboratories such as MIT, NASA, UC Berkeley, Yale University, Duke University, NIST and many more.
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| Features |
- Inexpensive
- Operates over the wavelength range 400 - 4000 cm-1(2.5-25um)
- Pre-aligned optics mount in the sample compartment of the spectrometer
- Measures single or multi-layer films and bulk materials thickness, optical and dielectric properties
- Free-carrier effect, resistivity measurements and doping profiles in the semiconductor
- Identification of chemical bonds
- Adhesion of interface of thin films
- Buried layers investigation and l Fraction of void in materials
- Comprehensive software for psi / delta, modeling and simulation functions, material library
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| Introduction |
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PHE104 infrared spectroscopic ellipsometer is a
unique infrared spectroscopic ellipsometry
instrument based on monochromator-dispersion. It
features highest accuracy, precision and is more
economical compared to FT-IR
spectrometer. PHE104 Infrared ellipsometry is a great
new technology that proves invaluable to solid
states and chemistry fields. It can be used on any
substrate and offers high sensitivity on thin
films down to surface passivation layers.
Information on the optical constants,film
thickness and chemical structures can be derived
from the measurements.
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| Software |
- Control of system calibration
- Calculation of Psi and Delta spectra
- Dispersion relations: fixed dielectric
constant, file, spline file, Cauchy, amorphous
semiconductors, abs. and transp. Sellmeier,
Schott glass, step function in UV, Urbach,
Lorentz, super lattices, multiple oscillators
(Drude), Forouhi-Bloomer, user defined free
dispersion formula
- Modeling, simulation and fitting supports
any multilayer structure (single, periodic)
each layer can be a homogeneous layer, an
interface, a roughness, an index gradient
(effective medium approximations:
Maxwell-Garnett, Bruggeman, Lorentz-Lorentz,
Clausius-Mosotti and its derivatives)
- Uniaxial and biaxial anisotropic layers
- Second derivative of spectra
- Point by point fits
- Network support (optional)
- Powerful macro language (interpreter)
- 2D/3D presentation graphics
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| Specifications |
| Spectral Range |
nominal: MIR:400 cm-1 ~ 4000 cm-1 |
| Optional Range |
FIR, NIR by user's request |
| Spectral Resolution |
4cm-1 |
| Angle of incidence |
35- 90° |
| Polarizer MIR |
> 99% at 1000 waveno. >99% at 3300 waveno. |
| Retarder |
KRS 5 crystal |
| Sample holder |
up to 10 mm height adjustment |
| Measuring spot |
1mm × 4mm, depending on angle of incidence |
| Repeatability |
± 0.003 |
| Accuracy |
± 0.01 |
| FIR option |
Mylar beamsplitter DTGS detector |
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